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Where physics meets chemistry: Thin film deposition from reactive plasmas [J]. Plasma-enabled sensing of urea and related amides on polyaniline [J]. The role of ions in plasma catalytic carbon nanotube growth: A review [J]. Viewed Full text. A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication. Paraskevi, Attica, Greece 2. Abstract In this work, we present plasma etching alone as a directed assembly method to both create the nanodot pattern on an etched polymeric PMMA film and transfer it to a silicon substrate for the fabrication of silicon nanopillars or cone-like nanostructuring.
Corresponding Authors: Athanasios Smyrnakis.
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XU Shuyan | National Institute of Education, Singapore (NIE)
Angelos Zeniou. Kamil Awsiuk.
Vassilios Constantoudis. Evangelos Gogolides. Notice the large process window for bias and the large height of the nanodots.
Plasma conditions: antenna power W, O 2 flow sccm at pressure of 0. The shield is applied on the electrode in all cases. All values extracted by the SEM image analysis shown in Fig. The observed peak indicates the order of the nanostructures. D, Applied Physics, , 44 17 : S Franssila. H C Pfeiffer. Monterey: SPIE, , B, , 14 6 : — H Schift. B, , 26 2 : Journal of Nanomaterials, , 1— G Zhang, D Wang. Chemistry, an Asian Journal, , 4 2 : — C Haynes, P Van Duyne. Journal of Physical Chemistry B, , — I W Hamley.
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Steven Girshick Publications
Microelectronic Engineering, , — Plasma Processes and Polymers, , 5 9 : — D, Applied Physics, , 47 12 : Nanotechnology, , 26 8 : Microelectronic Engineering, , 88 8 : — H V Jansen. First published: 5 July About this book In this single work to cover the use of plasma as nanofabrication tool in sufficient depth internationally renowned authors with much experience in this important method of nanofabrication look at reactive plasma as a nanofabrication tool, plasma production and development of plasma sources, as well as such applications as carbon-based nanostructures, low-dimensional quantum confinement structures and hydroxyapatite bioceramics.
Written principally for solid state physicists and chemists, materials scientists, and plasma physicists, the book concludes with the outlook for such applications. Reviews "The authors have managed to write a very informative and inspiring book about a fascinating topic of advanced plasma science and materials processing. Author Bios Dr. His research topics include chemically active plasmas for nanofabrication, synthesis of functional materials and bio-compatible coatings, development of industrial process specifications and integrated plasma facilities for materials synthesis and surface modification, as well as several fundamental topics.
Ostrikov's work was honored several times and published in more than papers in international journals and conference proceedings. Professor Xu's research interests include development of plasma sources for surface processing and modification, materials deposition and low-energy ion implantation, plasma- aided bioceramic coatings, plasma assembly of nanostructures, as well as modelling and simulation of chemically active plasma-grown nanoparticles and nanocluster dynamics and self-organization processes.
Professor Xu has published more than papers.
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